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引用本文格式: Zhang Peng-Fei,Zhong Rui,Wang Yao,Jia Li-Ya,Wang Fang,Liu Yu-Huai. Reduction of electron leakage in deep ultraviolet laser diodes by inverted two-step gradient stepped electron blocking layer [J]. J. At. Mol. Phys., 2023, 40(1): 014002 (in Chinese) [张鹏飞,钟瑞,王瑶,贾李亚,王芳,刘玉怀. 利用倒双阶渐变阶梯形电子阻挡层减少深紫外激光二极管的电子泄露 [J]. 原子与分子物理学报, 2023, 40(1): 014002]
 
利用倒双阶渐变阶梯形电子阻挡层减少深紫外激光二极管的电子泄露
Reduction of electron leakage in deep ultraviolet laser diodes by inverted two-step gradient stepped electron blocking layer
摘要点击 507  全文点击 124  投稿时间:2021-10-20  修订日期:2021-11-16
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DOI编号   
中文关键词   AlGaN  深紫外激光二极管  电子阻挡层  电子泄露
英文关键词   AlGaN  deep ultraviolet laser diodes  electron blocking layer  electron leakage
基金项目   国家自然科学基金重点项目
作者单位E-mail
张鹏飞 郑州大学 18838988554@163.com 
钟瑞 郑州轻工业大学  
王瑶 郑州大学  
贾李亚 郑州大学  
王芳 郑州大学  
刘玉怀* 郑州大学 ieyhliu@zzu.edu.cn 
中文摘要
    本文提出了用双阶渐变阶梯和倒双阶渐变阶梯形电子阻挡层(EBL)以减少AlGaN基深紫外激光二极管(DUV-LDs)在p型区的电子泄露,并用Crosslight软件模拟仿真了双阶渐变阶梯和倒双阶渐变阶梯形EBL结构的光电特性,结果发现:具有倒双阶渐变阶梯形EBL的激光器拥有比双阶渐变阶梯形EBL激光器更高的斜率效率(SE),更高的输出功率,更低的阈值电流和阈值电压,更高的有效势垒高度和更低的电子泄露。这意味着前者拥有更强的抑制电子泄露的能力。在与矩形EBL结构对比中发现,所提出的结构还提高了有源区载流子浓度和辐射复合速率,进一步提高了DUV-LDs的光电性能。
英文摘要
    This paper proposes two-step gradient stepped and inverted two-step gradient stepped electron blocking layer (EBL) structures to reduce the electron leakage of AlGaN-based deep ultraviolet laser diodes (DUV-LDs) in the p-type region. The Crosslight software is used to simulate the photoelectric characteristics of the two-step gradient stepped and the inverted two-step gradient stepped EBL structures.It is found that the lasers with inverted two-step gradient stepped EBL have higher slope efficiency, higher output power, lower threshold current and threshold voltage, higher effective barrier height and lower electron leakage than those with double-step gradual stepped EBL,suggesting that the former has a stronger ability to suppress electron leakage. Compared with the rectangular EBL structure, the proposed structures also increase the carrier concentration and radiative recombination rate in the active region, and further improve the photoelectric performance of the DUV-LDs.

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