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引用本文格式: Wan Lin,Fu Hong-Tao,Yuan Zhi-Ling,Wang Chao,Zang Lin-Ge,Luo Xiao-Bing. The Development of Radio Frequency Ion Source for NPA Calibration System [J]. J. At. Mol. Phys., 2019, 36: 789 (in Chinese) [万林,付宏涛,袁志凌,汪超,臧临阁,罗小兵. 用于NPA标定系统的高频离子源研制 [J]. 原子与分子物理学报, 2019, 36: 789]
 
用于NPA标定系统的高频离子源研制
The Development of Radio Frequency Ion Source for NPA Calibration System
摘要点击 218  全文点击 67  投稿时间:2018-11-01  修订日期:2018-11-29
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DOI编号   
中文关键词   NPA  高频离子源  束流强度
英文关键词   NPA  rf ion source  ion beam
基金项目   国家磁约束核聚变能发展研究专项(2013GB104002B); 国家自然科学基金项目(11505052)
作者单位E-mail
万林 四川大学 1026624175@qq.com 
付宏涛 四川大学 528510578@qq.com 
袁志凌 四川大学 1420081073@qq.com 
汪超 四川大学 923570321@qq.com 
臧临阁 核工业西南物理研究院 zanglinge@swip.ac.cn 
罗小兵 四川大学 luoxb@scu.edu.cn 
中文摘要
    研制了一台用于Neutral Particle Analyzer(NPA)标定系统的高频离子源,对其性能参数进行了实验测量,得到引出束流与高频振荡器板压、引出电压及放电气压之间的特性曲线,对影响引出束流稳定性的原因进行了分析。结果表明:当工作气体为氢气,在板压580V、引出电压1600V、聚焦电压1550V和气压9.5×10-4Pa时,能引出66μA的离子流;在41μA束流条件下,4小时内的束流稳定性优于2.6%,影响束流稳定性的主要因素是放电管内工作气体气压的波动和等离子体温度的升高。此结果可以满足HL-2A/M上NPA系统的标定对离子源的要求。
英文摘要
    A high-frequency ion source for Neutral Particle Analyzer (NPA) calibration system was developed in this work. The performance parameters were experimentally measured to obtain the relationship between the beam current and the high-frequency oscillator plate voltage, and the extraction voltage, and the discharge pressure. The results show that the ion current of 66μA can be extracted when the working gas is hydrogen,the plate pressure is 580V, the extraction voltage is 1600V, the focusing voltage is 1550V and the pressure is 9.5×10-4Pa. Under the condition of 41μA , the stability is better than 2.6% within 4 hours. The main factors affecting the stability of the beam are the fluctuation of the working gas pressure in the discharge tube and the plasma temperature. It’s found that the performance of this high-frequency ion source fulfill the designed requirements for the calibration of the NPA system on the HL-2A/M.

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